Synopsys, Inc. (Nasdaq:SNPS), a world leader in software and IP for semiconductor design and manufacturing, today announced the capability to pipeline key manufacturing applications. This new Proteus ...

MOUNTAIN VIEW, Calif., Feb. 25, 2013 -- Synopsys, Inc. (Nasdaq: SNPS), a global leader providing software, IP and services used to accelerate innovation in chips and electronic systems, today ...

“We require a highly accurate lithographic verification solution that has a low cost of ownership and and has ability to reduce our process development time,” said Nobuyasu Yui, department manager, ...

Synopsys and Systems on Silicon Manufacturing, a Singapore-based joint venture of NXP Semiconductors and Taiwan Semiconductor Manufacturing, announced their adoption of Synopsys' Proteus LRC. SSMC has ...

MOUNTAIN VIEW, Calif., Feb. 22, 2016 – Synopsys, Inc. (Nasdaq: SNPS), today announced adoption of its Proteus ™ Optical Proximity Correction (OPC) platform by CSMC Technologies Corporation, a ...

SAN JOSE, Calif., March 18, 2024 (GLOBE NEWSWIRE) -- GTC -- NVIDIA (NVDA) today announced that TSMC and Synopsys are going into production with NVIDIA’s computational lithography platform to ...

PARIS — Japan's Renesas Technology Corp. announced it has selected Synopsys' Proteus optical proximity correction (OPC) software for 28nm development. By utilizing Synopsys' Proteus, Renesas said it ...

Nikon Corporation, which supplies lithography equipment for microelectronics manufacturing, said its optical lithography exposure tool data is available for the latest release of EDA giant Synopsys' ...